VLSI Technology

Lecture 1 - Introduction on VLSI Design

Lecture 2 - Bipolar Junction Transistor Fabrication

Lecture 3 - MOSFET Fabrication for IC

Lecture 4 - Crystal Structure of Si

Lecture 5 - Crystal Structure (Continued.)

Lecture 6 - Defects in Crystal + Crystal growth

Lecture 7 - Crystal growth Contd + Epitaxy I

Lecture 8 - Epitaxy II - Vapour phase Epitaxy

Lecture 9 - Epitaxy III - Doping during Epitaxy

Lecture 10 - Molecular beam Epitaxy

Lecture 11 - Oxidation I - Kinetics of Oxidation

Lecture 12 - Oxidation II - Oxidation rate constants

Lecture 13 - Oxidation III - Dopant Redistribution

Lecture 14 - Oxidation IV - Oxide Charges

Lecture 15 - Diffusion I - Theory of Diffusion

Lecture 16 - Diffusion II - Infinite Source

Lecture 17 - Diffusion III - Actual Doping Profiles

Lecture 18 - Diffusion IV - Diffusion Systems

Lecture 19 - Ion - Implantation Process

Lecture 20 - Ion - Implantation Process

Lecture 21 - Annealing of Damages

Lecture 22 - Masking during Implantation

Lecture 23 - Lithography - I

Lecture 24 - Lithography - II

Lecture 25 - Wet Chemical Etching

Lecture 26 - Dry Etching

Lecture 27 - Plasma Etching Systems

Lecture 28 - Etching of Si,Sio2,SiN and other materials

Lecture 29 - Plasma Deposition Process

Lecture 30 - Metallization - I

Lecture 31 - Problems in Aluminium Metal contacts

Lecture 32 - IC BJT - From junction isolation to LOCOS

Lecture 33 - Problems in LOCOS + Trench isolation

Lecture 34 - More about BJT Fabrication and Realization

Lecture 35 - Circuits + Transistors in ECL Circuits

Lecture 36 - MOSFET I - Metal gate vs. Self-aligned Poly-gate

Lecture 37 - MOSFET II Tailoring of Device Parameters

Lecture 38 - CMOS Technology

Lecture 39 - Latch - up in CMOS

Lecture 40 - BICMOS Technology